While you can use your preferred CAD software to generate the layout, the design should be exported to formats that are compatible with the Heidelberg Instruments (HIMT) laser writing equipments used in CMi, such as (in order of recommendation): Some are proprietary, some public, some standard. There exist many layout file formats to describe such layouts. To create a complete 2D layout, the patterns can be drawn using dedicated computer-assisted design (CAD) softwares, generated using mathematics softwares such as Matlab or Octave, or coded using python/ruby programmed scripts. This will be a required step for either the fabrication of a Cr blank mask (to use on a mask-aligner or a stepper), or for exposing the photoresist with a UV laser (direct laser writing).
to distinguish the areas where UV light will expose the photoresist from the areas where it will not. When you want to create a pattern on a wafer with photolithography, you have to describe or digitize the pattern by geometric shapes, i.e.
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